以化學氣相沉積法在二硒化鎢上選擇性成長二硒化釩及其厚度控制
| dc.contributor | 陳家俊 | zh_TW |
| dc.contributor | Chen, Chia-Chun | en_US |
| dc.contributor.author | 林宏叡 | zh_TW |
| dc.contributor.author | Lin, Hung-Jui | en_US |
| dc.date.accessioned | 2025-12-09T08:10:06Z | |
| dc.date.available | 9999-12-31 | |
| dc.date.issued | 2025 | |
| dc.description.sponsorship | 化學系 | zh_TW |
| dc.identifier | 61242029S-47430 | |
| dc.identifier.uri | https://etds.lib.ntnu.edu.tw/thesis/detail/51ce49d2a083fe16ae9f4eb44c76d8da/ | |
| dc.identifier.uri | http://rportal.lib.ntnu.edu.tw/handle/20.500.12235/125429 | |
| dc.language | 中文 | |
| dc.title | 以化學氣相沉積法在二硒化鎢上選擇性成長二硒化釩及其厚度控制 | zh_TW |
| dc.title | Area-Selective Growth and Thickness-Controlled of Vanadium Diselenide on Tungsten Diselenide via Chemical Vapor Deposition | en_US |
| dc.type | 學術論文 |