Enhanced Dynamic Annealing in Ga+ ion-implanted GaN Nanowires

dc.contributor國立臺灣師範大學化學系zh_tw
dc.contributor.authorS. Dharaen_US
dc.contributor.authorA. Dattaen_US
dc.contributor.authorC.-T. Wuen_US
dc.contributor.authorZ.-H. Lanen_US
dc.contributor.authorK.-H. Chenen_US
dc.contributor.authorY.-L. Wangen_US
dc.contributor.authorL.-C. Chenen_US
dc.contributor.authorC.-W. Hsuen_US
dc.contributor.authorH.-M. Linen_US
dc.contributor.authorChia-Chun Chenen_US
dc.date.accessioned2014-12-02T06:41:30Z
dc.date.available2014-12-02T06:41:30Z
dc.date.issued2003-01-20zh_TW
dc.description.abstractGa+ion implantation of chemical-vapor-deposited GaNnanowires (NWs) is studied using a 50-keV Ga+focused ion beam. The role of dynamic annealing (defect-annihilation) is discussed with an emphasis on the fluence-dependent defect structure. Unlike heavy-ion-irradiated epitaxialGaN film, large-scale amorphization is suppressed until a very high fluence of 2×1016 ions cm−2. In contrast to extended-defects as reported for heavy-ion-irradiated epitaxialGaN film, point-defect clusters are identified as major component in irradiated NWs. Enhanced dynamic annealing induced by high diffusivity of mobile point-defects in the confined geometry of NWs is identified as the probable reason for observed differences.en_US
dc.description.urihttp://scitation.aip.org/docserver/fulltext/aip/journal/apl/82/3/1.1536250.pdf?expires=1395214475&id=id&accname=424340&checksum=10457639CBF7FF76C1E866A965BCD40Dzh_TW
dc.identifierntnulib_tp_C0301_01_017zh_TW
dc.identifier.issn0003-6951zh_TW
dc.identifier.urihttp://rportal.lib.ntnu.edu.tw/handle/20.500.12235/42301
dc.languageen_USzh_TW
dc.publisherAmerican Institute of Physics(AIP) Publishingen_US
dc.relationApplied Physics Letters, 82(3), 451-453.en_US
dc.relation.urihttp://dx.doi.org/10.1063/1.1536250zh_TW
dc.titleEnhanced Dynamic Annealing in Ga+ ion-implanted GaN Nanowiresen_US

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