教師著作

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    High-phase-purity zinc-blende InN on r-plane sapphire substrate with controlled nitridation pretreatment
    (American Institute of Physics (AIP), 2008-03-17) C.-L. Hsiao; T.-W. Liu; C.-T. Wu; H.-C. Hsu; G.-M. Hsu; L.-C. Chen; W.-Y. Shiao; C.-C. Yang; A. Gaellstroem; P.-O. Holtz; Chia-Chun Chen; K.-H. Chen
    High-phase-purity zinc-blende (zb) InN thin film has been grown by plasma-assisted molecular-beam epitaxy on r-plane sapphire substrate pretreated with nitridation. X-ray diffraction analysis shows that the phase of the InN films changes from wurtzite (w) InN to a mixture of w-InN and zb-InN, to zb-InN with increasing nitridation time. High-resolution transmission electron microscopy reveals an ultrathin crystallized interlayer produced by substrate nitridation, which plays an important role in controlling the InN phase. Photoluminescence emission of zb-InN measured at 20 K shows a peak at a very low energy, 0.636 eV, and an absorption edge at ∼0.62 eV is observed at 2 K, which is the lowest bandgap reported to date among the III-nitride semiconductors.