The Plotting of Laue X-Ray Diffraction Pattern by Computation
dc.date.accessioned | 2014-10-27T15:24:21Z | |
dc.date.available | 2014-10-27T15:24:21Z | |
dc.date.issued | 1985-06-?? | zh_TW |
dc.description.abstract | 以入射X光方向為準,若晶體的方向為已知,則其勞伊X-光繞射圖形可以微電腦計算繪製。這些圖形可當作標準圖形,直接和相同情況下實驗的圖形比較而定出實驗時各繞射面之指數。 | zh_tw |
dc.description.abstract | Laue x-ray diffraction patterns are generated by computation when the orienta-tion of crystal as referred to incident x-ray beam is known. These plots can serve as standard patterns to index Laue photographs directly. | en_US |
dc.identifier | 68792D68-1F86-4611-0961-A4D34C6B2DFE | zh_TW |
dc.identifier.uri | http://rportal.lib.ntnu.edu.tw/handle/20.500.12235/17255 | |
dc.language | 英文 | zh_TW |
dc.publisher | 國立臺灣師範大學研究發展處 | zh_tw |
dc.publisher | Office of Research and Development | en_US |
dc.relation | (30),469-479 | zh_TW |
dc.relation.ispartof | 師大學報 | zh_tw |
dc.subject.other | X光 | zh_tw |
dc.subject.other | 計算 | zh_tw |
dc.subject.other | 勞伊 | zh_tw |
dc.subject.other | 圖形 | zh_tw |
dc.subject.other | 繞射 | zh_tw |
dc.subject.other | 繪製 | zh_tw |
dc.title | The Plotting of Laue X-Ray Diffraction Pattern by Computation | zh-tw |
dc.title.alternative | 勞伊X-光繞射圖形之微電腦計算及繪製 | zh_tw |
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