Fabrication of Two-Dimensional Arrays of CdSe Pillars Using e-Beam Lithography and Electrochemical Deposition

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dc.contributor國立臺灣師範大學化學系zh_tw
dc.contributor.authorY.-W. Suen_US
dc.contributor.authorC.-S. Wuen_US
dc.contributor.authorChia-Chun Chenen_US
dc.contributor.authorC.-D. Chenen_US
dc.date.accessioned2014-12-02T06:41:30Z
dc.date.available2014-12-02T06:41:30Z
dc.date.issued2003-01-01zh_TW
dc.description.abstractTwo-dimensional arrays of high refractive index structures can be fabricated using a combination of e-beam lithography for pattern definition and electrochemical deposition for structure formation. The potential of this method is demonstrated for CdSe, where nanopillars, mushrooms (see Figure), walls, and crosses are prepared. Such arrays have potential in optical device applications such as photonic crystals and waveguides.en_US
dc.description.urihttp://onlinelibrary.wiley.com/doi/10.1002/adma.200390008/pdfzh_TW
dc.identifierntnulib_tp_C0301_01_014zh_TW
dc.identifier.issn0935-9648zh_TW
dc.identifier.urihttp://rportal.lib.ntnu.edu.tw/handle/20.500.12235/42298
dc.languageen_USzh_TW
dc.publisherWiley-VCH Verlagen_US
dc.relationAdvanced Materials, 15(1), 49-51.en_US
dc.relation.urihttp://dx.doi.org/10.1002/adma.200390008zh_TW
dc.subject.otherArraysen_US
dc.subject.other2Den_US
dc.subject.otherCadmium selenideen_US
dc.subject.otherElectrochemical depositionen_US
dc.subject.otherLithographyen_US
dc.subject.othere-beamen_US
dc.subject.otherPatterningen_US
dc.subject.otherSemiconductorsen_US
dc.titleFabrication of Two-Dimensional Arrays of CdSe Pillars Using e-Beam Lithography and Electrochemical Depositionen_US

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