Effects of Various Ion-Typed Surfactants on Silicon Anisotropic Etching Properties in KOH and TMAH Solutions

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dc.contributor國立臺灣師範大學機電工程學系zh_tw
dc.contributor.author楊啟榮zh_tw
dc.contributor.author陳柏穎zh_tw
dc.contributor.author林明憲zh_tw
dc.contributor.author邱源成zh_tw
dc.contributor.author李榮宗zh_tw
dc.date.accessioned2014-10-30T09:36:18Z
dc.date.available2014-10-30T09:36:18Z
dc.date.issued2004-11-26zh_TW
dc.identifierntnulib_tp_E0403_02_020zh_TW
dc.identifier.urihttp://rportal.lib.ntnu.edu.tw/handle/20.500.12235/36984
dc.languageenzh_TW
dc.relation2004 中國機械工程學會（CSME）第21屆全國學術研討會論文集，高雄：中山大學，臺灣。zh_tw
dc.titleEffects of Various Ion-Typed Surfactants on Silicon Anisotropic Etching Properties in KOH and TMAH Solutionsen_US

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