氧化鉿鋯二極體與場效電晶體之記憶體應用

dc.contributor李敏鴻zh_TW
dc.contributorLee, M. H.en_US
dc.contributor.author陳宣翰zh_TW
dc.contributor.authorChen, Hsuan-Hanen_US
dc.date.accessioned2019-09-04T01:27:58Z
dc.date.available不公開
dc.date.available2019-09-04T01:27:58Z
dc.date.issued2017
dc.description.abstract具有鐵電效應的新鐵電材料-鉿基氧化物(Hafnium-based Oxides),這幾年除了研究討論度相當高之外,應用面也是相當的廣,例如其鐵電負電容特性,藉由突破次臨界擺幅的物理極限60mV/dec,降低了操作電壓VDD,間接降低了元件的耗能,達到低功耗的目的。又例如藉由鐵電特性,使電流-電壓曲線具有遲滯現象,使之可以應用在1T記憶體上面,也可以製作成MIM結構應用在1T-1C記憶體中,而且鉿基氧化物與矽基板相容性高,可以整合在現有的CMOS半導體製程上。本研究將針對於應用在鐵電記憶體上,使用Hf1-xZrxO2作為鐵電層,藉著不同物理厚度、不同摻雜比例,以及退火溫度等條件,探討分析其在記憶體應用方面的表現。 關鍵字:鉿基氧化物、負電容電晶體、次臨界擺幅、金屬-鐵電層-金屬結構、鐵電電晶體。zh_TW
dc.description.abstractIn recent years, Hafnium-based oxides, have experienced intensive studies and have already been widely application, such as FeRAM, negative-capacitance (NC) FET, and other related fields. With the application of NC-FET, by breaking through the subthreshold swing limit (60 mV/dec,) the reduction in operating voltage (VDD) can results in lower power consumption. Moreover, Hafnium-based oxides can be used 1T-1C and 1T structure memory. In this work, devices are made into MIM structure or FET to study characteristic performance by different conditions such as annealing temperatures and dopant contents. Keyword: Hafnium-based Oxide, NC-FET, subthreshold swing, metal-ferroelectric film-metal structure, FeFETen_US
dc.description.sponsorship光電科技研究所zh_TW
dc.identifierG060448030S
dc.identifier.urihttp://etds.lib.ntnu.edu.tw/cgi-bin/gs32/gsweb.cgi?o=dstdcdr&s=id=%22G060448030S%22.&%22.id.&
dc.identifier.urihttp://rportal.lib.ntnu.edu.tw:80/handle/20.500.12235/98016
dc.language中文
dc.subject鉿基氧化物zh_TW
dc.subject負電容電晶體zh_TW
dc.subject次臨界擺幅zh_TW
dc.subject鐵電電晶體zh_TW
dc.subject金屬-鐵電層-金屬結構zh_TW
dc.subjectHafnium-based Oxidesen_US
dc.subjectNC-FETen_US
dc.subjectsubthreshold swingen_US
dc.subjectmetal-ferroelectric film-metal structureen_US
dc.subjectFeFETen_US
dc.title氧化鉿鋯二極體與場效電晶體之記憶體應用zh_TW
dc.titleHf1-xZrxO2 Diode and MOSFETs for Memory Applicationsen_US

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