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Title: Miniaturized multilayer dielectric coatings using metal masks fabricated by electroforming and photolithography technologies
Authors: 國立臺灣師範大學機電工程學系
Jaing, Cheng-Chung
Yang, Chii-Rong
Chang, Chun-Ming
Chang, Yung-Hsin
Lee, Chao-Te
Hsiao, Chine-Nan
Issue Date: 29-Aug-2008
Publisher: SPIE
Abstract: The Ni films replacing photoresist serve as a mask to selectively deposit optical thin films at a substrate temperature of 300蚓 by an electron-beam gun evaporation. The photolithograph is used to define the growth of Ni films by an electroforming technique. Mosaic patterns with a width of 20&mgr;m are chosen as an arrangement of red color filters. The red filters are formed of alternate SiO2 and TiO2 layers and the average transmittance of red filters is larger than 90%. The experimental results successfully illustrate that the combinative uses of photolithography, electroforming and electron-beam gun evaporation can make miniaturized multilayer dielectric coatings with high light transmittance in a hot deposition.
ISBN: 978-081-947-287-8
Other Identifiers: ntnulib_tp_E0403_02_053
Appears in Collections:教師著作

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