一維多層結構光學性質應用與分析

dc.contributor吳謙讓zh_TW
dc.contributorCHIEN-JANG WUen_US
dc.contributor.author吳培宇zh_TW
dc.contributor.authorPEI-YU WUen_US
dc.date.accessioned2019-09-04T01:33:53Z
dc.date.available不公開
dc.date.available2019-09-04T01:33:53Z
dc.date.issued2012
dc.description.abstract在這篇論文中,我們研究了在兩個不同的一維多層結構的光學性質。在第一種結構中,我們利用受抑全內反射(FTIR)的原理來設計一個50/50分束器。我們考慮的層狀結構是一個空氣層被夾在兩個高折射率層中,在這種結構中的分束器為入射波的角度、空氣層的厚度及入射波極化的函數,利用這些關鍵條件來設計分析。在第二種結構中,我們考慮的磁化電漿體光子晶體(PPC)。 在TM波模式下,我們探討了磁化電漿體光子晶體的有效電漿頻率,得到有效電漿頻率為靜態磁場、入射波角度、介質層的厚度、電漿層厚度的函數,利用這些函數來進行分析研究。zh_TW
dc.description.abstractIn this thesis, we study the optical properties in two different one-dimensional multilayer structures. In this first structure, we use the frustrated total internal reflection (FTIR) to design a 50/50 beam splitter. We consider the structure where a air layer is sandwiched by two high-index layers. The design analysis for this beam splitter is made as a function of angle of incidence, thickness of air gap, and the polarization of incident wave. Some critical conditions for this design are given. In the second structure, we consider a magnetized plasma photonic crystal (PPC). Under the TM mode, we investigate the effective plasma frequency for the PPC. The effective plasma frequency is investigated as a function of the static magnetic field, the angle of incidence, the thickness of dielectric layer, and the thickness of the plasma layer.en_US
dc.description.sponsorship光電科技研究所zh_TW
dc.identifierGN0699480053
dc.identifier.urihttp://etds.lib.ntnu.edu.tw/cgi-bin/gs32/gsweb.cgi?o=dstdcdr&s=id=%22GN0699480053%22.&%22.id.&
dc.identifier.urihttp://rportal.lib.ntnu.edu.tw:80/handle/20.500.12235/98273
dc.language中文
dc.subject受抑全內反射zh_TW
dc.subject電漿體光子晶體zh_TW
dc.subject分束器zh_TW
dc.subject有效電漿頻率zh_TW
dc.subjectFTIRen_US
dc.subjectPPCen_US
dc.subjectBSen_US
dc.subjectEffective plasma frequencyen_US
dc.title一維多層結構光學性質應用與分析zh_TW
dc.titleApplication and Analysis of Optical Properties in One-dimensional Multilayer Structuresen_US

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