PQ/PMMA材料的備製與其暗反應特性之研究
| dc.contributor | 謝美莉 | zh_TW |
| dc.contributor | Mei-Li Hsieh | en_US |
| dc.contributor.author | 陳韋成 | zh_TW |
| dc.contributor.author | Wei-Cheng Chen | en_US |
| dc.date.accessioned | 2019-09-04T01:33:30Z | |
| dc.date.available | 不公開 | |
| dc.date.available | 2019-09-04T01:33:30Z | |
| dc.date.issued | 2011 | |
| dc.description.abstract | 本論文主要研究方向在探討PQ/PMMA材料製程，以及其光學特性量測。首先我們將介紹PQ/PMMA材料的製作流程，並製作出不同厚度的材料，接著架設兩道光干涉系統來記錄光柵於此材料中，並量測此材料的繞射效率與曝光能量之關係。此外，我們亦針對不同曝光能量與速率探討繞射效率的暗反應特性。 | zh_TW |
| dc.description.abstract | The main goal of this research is to fabricate the PQ/PMMA materials and measure its optical properties. First, we describe the fabricating procedure and produce some PQ/PMMA bulk materials with different thickness. Then, an optical interference system has been setup to measure the diffraction efficiency and dark-effect of the various expose energy. | en_US |
| dc.description.sponsorship | 光電科技研究所 | zh_TW |
| dc.identifier | GN0698480240 | |
| dc.identifier.uri | http://etds.lib.ntnu.edu.tw/cgi-bin/gs32/gsweb.cgi?o=dstdcdr&s=id=%22GN0698480240%22.&%22.id.& | |
| dc.identifier.uri | http://rportal.lib.ntnu.edu.tw:80/handle/20.500.12235/98258 | |
| dc.language | 中文 | |
| dc.subject | PQ/PMMA 材料製備 | zh_TW |
| dc.subject | 材料製備 | zh_TW |
| dc.subject | PQ/PMMA | en_US |
| dc.subject | material | en_US |
| dc.title | PQ/PMMA材料的備製與其暗反應特性之研究 | zh_TW |
| dc.title | A study on fabrication and dark-Effect of Phenanthrenequinone doped Poly(methy1 methacrylate)(PQ/PMMA) materials | en_US |