電沉積法應用於TiO2光觸媒薄膜最佳化參數製程之研究

dc.contributor李景峰zh_TW
dc.contributorLi Jeen Fongen_US
dc.contributor.author蔡明甫zh_TW
dc.contributor.authorTasi Ming Fuen_US
dc.date.accessioned2019-09-04T02:11:02Z
dc.date.available2019-10-20
dc.date.available2019-09-04T02:11:02Z
dc.date.issued2014
dc.description.abstract本研究為使用電沉積法 (electro-deposition process) 於不鏽鋼板上製作二氧化鈦(TiO2)光觸媒薄膜,以進行開發光觸媒產品的基礎研究。電沉積製程所使用的工作流體是採用溶膠凝膠法混合酒精稀釋製成過氧鈦酸鍍液,再藉由電沉積反應將二氧化鈦沉積在304SS不鏽鋼板上,以製成奈米光觸媒薄膜。並檢測其表面形貌、光催化特性與親水性等理化特性。利用XRD、HR-FESEM、表面輪廓儀等儀器進行量測並分析製成參數與薄膜特性關係,選出適合的鍍膜參數,作為後續研究的參考範本。在電沉積製程方面,針對不同電壓與沉積時間的參數、沉積薄膜的表面特性與材質進行討論,並經由退火方式觀察其結晶變化情形。在光催化研究中,分析光觸媒照紫外光前後改質的情形,並探討照光後接觸角的變化。研究結果顯示,在控制電壓與沉積時間的條件下,可以得到沉積薄膜,但經由SEM觀看後,表面並不完整。而經由退火過程,可得明顯的結晶粒子。而鍍膜試片在光催化實驗中,顯示照光後的反射率有減少,顯示鍍膜的抗紫外線特性有增加;而在接觸角量測方面,未照紫外光時可以達到41.91度,證明製備的TiO2薄膜還具有疏水性。本研究期望能在未來提供製作在規格304SS不鏽鋼板上的TiO2光觸媒薄膜之參考,並能應用在空調系統設置不鏽鋼濾網上,以增進其除汙抑菌效果。zh_TW
dc.description.abstractIn this research, the titanium dioxide (TiO2) photocatalyst film deposited on stainless steel plates by electrodeposition technique , and it is useful for photocatalyst products development. Electrodeposition processes used by the working fluid mixing with diluted alcohol to produce peroxotitanic acid bath by sol-gel method , so titanate ions deposited on the 304SS stainless steel plates that made of nano photocatalyst film, and then it would strengthen crystallization in the photocatalyst film by annealing, detection the surface morphology、Photocatalytic and hydrophilic properties such as hydrophilicity . Using XRD, HR-FE SEM, surface profiler and other equipment to performed made from the parameters measured and analyzed the relationship between film properties, chosen a suitable coating parameters, used as following research of the reference. In the electrodeposition process, for the parameters of different voltage and deposition tim、surface properties of the deposited films and materials to discussion,then using annealing method to observe changes in the crystal case. In photocatalytic , analysis of the situation before and after the modification of the photocatalyst as UV, discussion after irradiation with UV light contact angle changes.The results showed, under the control of voltage and deposition time conditions, the deposited film can be obtained, but the watch by SEM, the surface is not complete.rather through annealing process, we can get a clear crystal particles. rather test pieces in the photocatalytic coating experiments, according to displayed after the light the reflectance a decrease, the display characteristics of the anti-UV coating increase. While in terms of the contact angle measurements, when not as ultraviolet light can reach 41.91 degrees, TiO2 thin films prepared also prove a hydrophobic The research can provide the future production of the titanium dioxide (TiO2) photocatalyst film deposited on 304SS stainless steel plates to reference and set with stainless steel strainer in air conditioning systems to improve their antimicrobial decontamination capabilities.en_US
dc.description.sponsorship工業教育學系zh_TW
dc.identifierGN060170034H
dc.identifier.urihttp://etds.lib.ntnu.edu.tw/cgi-bin/gs32/gsweb.cgi?o=dstdcdr&s=id=%22GN060170034H%22.&%22.id.&
dc.identifier.urihttp://rportal.lib.ntnu.edu.tw:80/handle/20.500.12235/98931
dc.language中文
dc.subject電沉積法zh_TW
dc.subject二氧化鈦薄膜zh_TW
dc.subject光催化特性zh_TW
dc.subjectelectrodepositionen_US
dc.subjecttitanium dioxide thin filmsen_US
dc.subjectphotocatalytic propertiesen_US
dc.title電沉積法應用於TiO2光觸媒薄膜最佳化參數製程之研究zh_TW
dc.titleElectrodeposition applied on Optimum Manufacture process of Titanium Dioxide Photocatalytic Filmen_US

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