電沉積法製備氧化鎢薄膜之特性與應用研究
Abstract
本研究使用定電流電沉積法(electrodeposition, ED)在ITO導電玻璃上製備氧化鎢(tungsten oxide, WO3)薄膜。使用HR-FESEM、XRD、α-STEP等儀器對薄膜特性進行量測與分析，並探討不同退火溫度、沉積時間與沉積電流對於WO3薄膜的結構與特性影響。最後篩選出具有較佳特性薄膜製程參數，進行鍍膜玻璃的隔熱應用研究。實驗結果顯示，沉積電流為3 mA、5 mA與7 mA時薄膜厚度與沉積時間成正比，沉積速率分別為2 nm/sec、4.9 nm/sec、7.6 nm/sec。當沉積電流大於7 mA時試片角落開始產生剝離現象，故建議沉積電流小於7 mA。在退火溫度影響薄膜結晶方面，薄膜在未經退火與退火250 ℃為非晶態，退火500 ℃與700 ℃為三斜晶態。光學特性在非晶態與三斜晶態分別具有抗紅外線穿透與增強紅外線穿透特性。在鍍膜玻璃的隔熱應用研究方面，以退火250 ℃試片具有最佳隔熱特性，溫度上升速率與最終溫度分別為0.131 ℃/min 與36.89 ℃。未來可藉由調整製程參數製備出符合不同應用領域元件，以達到提升效率與節能的目的。
In this study, we produced the tungsten oxide (WO3) thin films on the indium tin oxide (ITO) glass by the electrodeposition method (ED). The characteristics of glass coated with WO3 thin films were measured and analyzed by using the HR-FESEM, XRD and α-STEP; moreover, the ED current, ED time and annealing temperature to influence the structure and characteristics of WO3 thin film were discussed. Finally, the optimal process parameters of WO3 coated glass with better properties were screened to conduct the applied research for thermal insulation. The experimental results showed that the WO3 film thickness is proportional to the ED current when the ED current at 3, 5 and 7 mA, and the deposition rate were 2, 4.9, and 7.6 nm/sec, respectively. The structure of WO3 thin films peeled when the ED current was over 7 mA, so the ED current should be controlled under 7 mA. As for the crystallization of the WO3 thin films, it was amorphous with controlled by as-deposited and annealing at 250 ℃; triclinic with annealing at 500 ℃ and 700 ℃. The optical characteristics of the coated glasses with amorphous or triclinic WO3 had anti-infrared and high infrared transmittance properties, respectively. As for the thermal insulation of WO3 coated glass, the WO3 coated glass had the best thermal insulation performance with annealing at 250 ℃, and the rise rate of temperature and the final temperature were 0.131 ℃/min and 36.89 ℃, respectively. The characteristics of WO3 coated glass can be tuned by different process parameters to form the element with the proper characteristics to meet different application, which can achieve the purpose of improving efficiency and energy conservation.
In this study, we produced the tungsten oxide (WO3) thin films on the indium tin oxide (ITO) glass by the electrodeposition method (ED). The characteristics of glass coated with WO3 thin films were measured and analyzed by using the HR-FESEM, XRD and α-STEP; moreover, the ED current, ED time and annealing temperature to influence the structure and characteristics of WO3 thin film were discussed. Finally, the optimal process parameters of WO3 coated glass with better properties were screened to conduct the applied research for thermal insulation. The experimental results showed that the WO3 film thickness is proportional to the ED current when the ED current at 3, 5 and 7 mA, and the deposition rate were 2, 4.9, and 7.6 nm/sec, respectively. The structure of WO3 thin films peeled when the ED current was over 7 mA, so the ED current should be controlled under 7 mA. As for the crystallization of the WO3 thin films, it was amorphous with controlled by as-deposited and annealing at 250 ℃; triclinic with annealing at 500 ℃ and 700 ℃. The optical characteristics of the coated glasses with amorphous or triclinic WO3 had anti-infrared and high infrared transmittance properties, respectively. As for the thermal insulation of WO3 coated glass, the WO3 coated glass had the best thermal insulation performance with annealing at 250 ℃, and the rise rate of temperature and the final temperature were 0.131 ℃/min and 36.89 ℃, respectively. The characteristics of WO3 coated glass can be tuned by different process parameters to form the element with the proper characteristics to meet different application, which can achieve the purpose of improving efficiency and energy conservation.
Description
Keywords
電沉積法, 光學特性, 氧化鎢薄膜, Electrodeposition, Optical characteristics, WO3 thin film