謝美莉Mei-Li Hsieh陳韋成Wei-Cheng Chen2019-09-04不公開2019-09-042011http://etds.lib.ntnu.edu.tw/cgi-bin/gs32/gsweb.cgi?o=dstdcdr&s=id=%22GN0698480240%22.&%22.id.&http://rportal.lib.ntnu.edu.tw:80/handle/20.500.12235/98258本論文主要研究方向在探討PQ/PMMA材料製程，以及其光學特性量測。首先我們將介紹PQ/PMMA材料的製作流程，並製作出不同厚度的材料，接著架設兩道光干涉系統來記錄光柵於此材料中，並量測此材料的繞射效率與曝光能量之關係。此外，我們亦針對不同曝光能量與速率探討繞射效率的暗反應特性。The main goal of this research is to fabricate the PQ/PMMA materials and measure its optical properties. First, we describe the fabricating procedure and produce some PQ/PMMA bulk materials with different thickness. Then, an optical interference system has been setup to measure the diffraction efficiency and dark-effect of the various expose energy.PQ/PMMA 材料製備材料製備PQ/PMMAmaterial