張國維Gao-Wei Chang簡宏達Hong-Da Jian2019-09-042004-08-092019-09-042004http://etds.lib.ntnu.edu.tw/cgi-bin/gs32/gsweb.cgi?o=dstdcdr&s=id=%22G0069170017%22.&%22.id.&http://rportal.lib.ntnu.edu.tw:80/handle/20.500.12235/98452鍍膜技術長久以來在光學、光電、半導體等產業扮演相當重要的角色。例如，在傳統光學產業中，透鏡必須進行鏡面的抗反射鍍膜，在光纖通訊產業中，其重要關鍵元件多波長分波多工器(DWDM)必須經由數十層甚至上百層的鍍膜處理才能完成。除了製程需即時監控外，為確保鍍膜品質，也必須對膜層厚度與相關參數進行量測。為達成此一功能，橢圓偏光量測技術長久以來已經是大家廣泛認同的一項非常重要之技術。本論文的目的主要有二： 1. 首先，我們對基礎與進階的橢偏儀組態去作理論的研究以及我們也討論不同橢偏儀的演進，舉例來說：消光式橢偏儀、光譜分光式橢偏儀、以及可變角度之光譜分光式橢偏儀。 2. 再者，我們將驗證在這些系統中橢偏方法的效能。 這篇論文裡我們對不同橢偏儀的組態作簡單的理論敘述，以及模擬消光式、光譜分光式以及可變角度之光譜分光式的橢偏系統。經由實驗我們也驗證了理論的研究，舉例來說：我們判定使用在橢偏系統中的極化器是否理想。在我們光譜反射式系統中，從干涉震盪數目的觀察裡我們建立對薄膜厚度量測的估算程序。最後，在可變角度之橢偏系統架構的實驗裡我們給予了簡單的分析。Coating technology has played an important role in optics, opto-electronics, semiconductor industries, etc. For example, a lens is usually treated with anti-reflection coating in traditional optical industry. In the industry of fiber-optics communication, the key component DWDM (dense wavelength division multiplexer) is coated with thin films of many layers even to hundreds of layers. As a result, in addition to real-time monitoring for product manufacturing, the measurement of coating performance of the key components is very important. To do this, ellipsometry has been widely recognized as an essential technology for many years. In this thesis, we focus on two major objectives as follows: 1. The first is to conduct a theoretical study on basic ellipsometry configurations and advanced ones, and to discuss the evolution of different ellipsometers, (for example, null ellipsometer, spectroscopic ellipsometer (SE), and variable-angle spectroscopic ellipsometer (VASE).) 2. The second is to verify the effectiveness of ellipsometric methods in these systems. This thesis briefly describes principles for different configurations of ellipsometers, and the null ellipsometry, spectroscopic ellipsometry, and variable-angle spectroscopic ellipsometry systems are simulated. We verify theoretical study by experiments. For instance, we check if a linear polarizer employed in the ellipsometer systems is ideal. Also, in our reflectometry system, we establish the of a thin film, for thickness measurement from observations of the number of interference oscillations. Finally, we give a simple analysis to the experiment of our VASE setup.橢圓偏光儀可變角度估算程序ellipsometervariable-angleevaluation process.