國立臺灣師範大學機電工程學系Ou, Sin-LiangCheng, Chin-PaoYeh, Chin-YenChung, Chung-JenKao, Kuo-ShengLin, Re-Ching2014-10-302014-10-302011-02-011022-6680http://rportal.lib.ntnu.edu.tw/handle/20.500.12235/36811The In10GexSb52-xSn23Te15 films (x = 2, 5, and 9) were deposited on nature oxidized silicon wafer and glass substrate by dc magnetron sputtering. The ZnS-SiO2 films were used as protective layers. The thickness of the In10GexSb52-xSn23Te15 film is 20 nm. We have studied the crystallization kinetics, structural and optical properties of the In10GexSb52-xSn23Te15 (x = 2, 5, and 9) recording films. It is found that the crystallization temperature of the film is increased with increasing Ge content. The optical contrasts of In10GexSb52-xSn23Te15 films with x = 2~9 are all higher than 30 % at a wavelength of 405 nm, showing that the films are suitable for blue laser optical recording media application.In-Ge-Sb-Sn-TePhase Change Optical RecordingThin Film