2014-10-272014-10-271985-06-??http://rportal.lib.ntnu.edu.tw/handle/20.500.12235/17255以入射X光方向為準，若晶體的方向為已知，則其勞伊X－光繞射圖形可以微電腦計算繪製。這些圖形可當作標準圖形，直接和相同情況下實驗的圖形比較而定出實驗時各繞射面之指數。Laue x-ray diffraction patterns are generated by computation when the orienta-tion of crystal as referred to incident x-ray beam is known. These plots can serve as standard patterns to index Laue photographs directly.X光計算勞伊圖形繞射繪製