國立臺灣師範大學化學系Y.-W. SuC.-S. WuChia-Chun ChenC.-D. Chen2014-12-022014-12-022003-01-010935-9648http://rportal.lib.ntnu.edu.tw/handle/20.500.12235/42298Two-dimensional arrays of high refractive index structures can be fabricated using a combination of e-beam lithography for pattern definition and electrochemical deposition for structure formation. The potential of this method is demonstrated for CdSe, where nanopillars, mushrooms (see Figure), walls, and crosses are prepared. Such arrays have potential in optical device applications such as photonic crystals and waveguides.Arrays2DCadmium selenideElectrochemical depositionLithographye-beamPatterningSemiconductors