程金保林奕儒2019-09-032008-7-312019-09-032006http://etds.lib.ntnu.edu.tw/cgi-bin/gs32/gsweb.cgi?o=dstdcdr&s=id=%22GN0693730161%22.&%22.id.&http://rportal.lib.ntnu.edu.tw:80/handle/20.500.12235/97148電致色變材料是近年來被學者專家廣泛研究的一項薄膜光學技術，它可以被應用在汽車和建築物之視窗玻璃上，以製作節省能源、調節光線及控制熱負荷之智慧型窗戶。本實驗利用脈衝直流反應磁控濺鍍法來沉積氧化鎳薄膜於ITO玻璃上，並探討各種濺鍍條件對薄膜成份、微結構、和電致色變性能的影響。 實驗結果發現，隨著氧氣流量的增加，薄膜中的氧含量會隨之增加；過高或過低的氧氣流量都會對氧化鎳的電致色變性能造成不利的影響，當氧氣流量為20 sccm時，在波長550nm處，其著色去色之穿透率變化可達27.88 %。當鍍膜時間超過135 min時，薄膜即會開始結晶化，隨著鍍膜時間從90 min增加到180 min時，氧化鎳的(200)從優取向越趨明顯，我們可以推論這是濺鍍過程中電漿的熱效應所致，當鍍膜時間為180 min時，可以在波長550nm處得到43.44 %的穿透率變化，這是薄膜中電荷容量增加所帶來的現象。 最後在實驗中並試圖以摻雜氮原子的方式來製備氧化鎳薄膜，實驗結果發現氧化鎳薄膜在550 nm波段的穿透率變化會隨著摻雜氮氣的流量增加而減少，當氮氣流量大於5 sccm時，薄膜幾乎失去其電致色變的能力。Recent years electrochromism have been extensively investigated due to their potential applications such as smart window of architecture and automobile glazing to save energy and modulate the transmission of light and solar radiation. Therefore, the objective of this study is to investigate the effects of sputtering conditions on the composition, microstructure, electrochromic properties of nickel oxide films prepared by pulse d.c. reactive magnetron sputtering. Experimental results indicated that oxygen content of the film was increased with increasing oxygen flow rate. When the oxygen flow rate in the over high or over low situation, they both make damage of electrochromic properties. At the oxygen flow rate of 20 sccm, the transmission change between colored and bleached states at a wavelength of 550 nm was 27.88 ％. It was also found that the crystallinity of films was obtained at the growth time longer than 135 min, with the growth time from 90 min increasing to 180 min, the (200) prefer orientation is becoming more obviously. This is probably due to the plasma heating effect. At the growth time of 180 min, the transmission change between colored and bleached states at a wavelength of 550 nm was 43.44 %. This is the result when the charge capacity of thin film increasing. In the end of the experiment, we try to prepare NiO thin films by doping N atom, experimental results indicated that change between colored and bleached states at a wavelength of 550 nm of the film was decreased with increasing nitrogen flow rate. When nitrogen flow rate was over 5 sccm, electrochromic properties of NiO films almost disappeared.互補式電致色變元件反應磁控濺鍍法氧化鎳薄膜complementary electrochromic devicereactive magnetron sputteringnickel oxide