探討氧化鋯介面層應用於氧化鋯鉿鐵電記憶體之電性可靠度研究
| dc.contributor | 鄭淳護 | zh_TW |
| dc.contributor | Cheng, Chun-Hu | en_US |
| dc.contributor.author | 張嘉祐 | zh_TW |
| dc.contributor.author | Chang, Chia-Yu | en_US |
| dc.date.accessioned | 2025-12-09T08:06:03Z | |
| dc.date.available | 2030-05-31 | |
| dc.date.issued | 2025 | |
| dc.description.sponsorship | 機電工程學系 | zh_TW |
| dc.identifier | 61173012H-47070 | |
| dc.identifier.uri | https://etds.lib.ntnu.edu.tw/thesis/detail/8c23e25e3e4aafbb398c6a01f1b6df0d/ | |
| dc.identifier.uri | http://rportal.lib.ntnu.edu.tw/handle/20.500.12235/125197 | |
| dc.language | 中文 | |
| dc.title | 探討氧化鋯介面層應用於氧化鋯鉿鐵電記憶體之電性可靠度研究 | zh_TW |
| dc.title | Electrical and Reliability Investigation of hafnium-Zirconium-Oxide Ferroelectric Memory Using a Zirconium-Oxide Interface Layer | en_US |
| dc.type | 學術論文 |