Please use this identifier to cite or link to this item: http://rportal.lib.ntnu.edu.tw:80/handle/77345300/36963
Title: Fabrication of nanoporous antireflection surfaces on silicon
Authors: 國立臺灣師範大學機電工程學系
Huang, Mao-Jung
Yang, Chii-Rong
Chiou, Yuang-Cherng
Lee, Rong-Tsong
Issue Date: 1-Nov-2008
Publisher: Elsevier
Abstract: After the surface of a silicon wafer has been texturized, the reflectance of the wafer surface can be reduced to increase the power generation efficiency of a silicon-based solar cell. This study presents the integration of self-assembled nanosphere lithography (SANSL) and photo-assisted electrochemical etching (PAECE) to fabricate a nanostructure array with a high aspect ratio on the surface of silicon wafer, to reduce its reflectance. The experimental results show that the etching depth of the fabricated nanopore array structure is about View the MathML source and its diameter is about 90 nm, such that the aspect ratio of the pore can reach about 68:1. The weighted mean reflectance of a blank silicon wafer is 40.2% in the wavelength range of 280–890 nm. Five-minute PAECE without SANSL reduces the weighted mean reflectance to 5.16%. Five-minute PAECE with SANSL reduces the weighted mean reflectance to 1.73%. Further coating of a 200 Å thick silicon nitride layer on the surface of a nanostructure array reduces the weighted mean reflectance even to 0.878%. The novel fabrication technology proposed in this study has the advantage of being low cost, and the fabricated nanostructure array can be employed as an antireflection structure in single crystalline silicon solar cells.
URI: http://rportal.lib.ntnu.edu.tw/handle/77345300/36963
ISSN: 0927-0248
Other Identifiers: ntnulib_tp_E0403_01_020
Appears in Collections:教師著作

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