Please use this identifier to cite or link to this item:
|Other Titles:||A Study on Training Design and Trainee's Satisfaction of Talent Development in Nanotechnology Based on University-Industry Collaboration|
National Taiwan Normal University Department of Technology Application and Human Resource Development
Nanotechnology has already been applied on all kinds of researches and industries and had a prominent influence in the world. The policies of many developed countries point out not only they are devoted to promoting the nanotechnology research but also combining nanotechnology educational programs with industries on talent development. In Taiwan, the government launched a national nanoscience and nanotechnology program in 2002 to promote and cultivate new talents who are able to develop the potential of nanotechnology. The Nano-Electro-Mechanical-Systems (NEMS) research center of National Taiwan University marks out a series of training courses for talent development taking advantage of resources between universities and nanotechnology industries. The purpose of this study is to explore and analyze instructional satisfactions and course preference from these trainees in the nanotechnology training programs. The research subjects are 140 participants took part in the training programs. Data analysis methods are as follows: descriptive statistics, multiple response analysis, and Cochran Q test analysis. In addition, researchers summarized trainee's feedback and recommendations from open-ended questions in the questionnaires. Finally, this study provides some conclusions: (1) trainee's instructional satisfactions are improved in the second year; (2) "Emerging Industry" and "Energy Technology" topics have the highest trainee's instructional satisfaction; (3) trainees proposed some recommendations that will assist instructors and curriculum developers of the NEMS center to proceed with further development in university nanotechnology courses.
|Appears in Collections:||科技與工程教育學刊|
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.