Please use this identifier to cite or link to this item: http://rportal.lib.ntnu.edu.tw:80/handle/20.500.12235/97142
Title: PDMS微反應器應用於金奈米微粒合成之研製
Development of a PDMS microreactor fabricated for synthesizing Au nanoparticles
Authors: 楊啟榮
Yang Chii-Rong
施建富
Shih Jian-Fu
Keywords: 金奈米微粒
SIGA製程
PDMS微反應器
矽模
界面活性劑
白金微加熱器
gold nanoparticles
SIGA process
PDMS microreactor
silicon mold
surfactant
Pt microheater
Issue Date: 2006
Abstract: 奈米微粒(nanoparticles)之研製為目前奈米科技重要的一環,其中金奈米微粒由於大小、光學性質、表面化學性質及無毒等特性,故被廣泛應用於光電科技、生醫檢測方面的研究。也因此近年來相關金米微粒的研製皆朝向如何提高微粒粒徑的均勻度及大小的可控性發展。 與傳統巨觀反應器相較,PDMS微反應器具有生物相容性高、可控性佳、可批次化生產及易於觀測等優點,預期將能改善傳統合成法之粒徑分佈不均、控制不精確等問題,達成反應器控制精確及金奈米微粒可批次生產等目的。因此本研究特以微機電中之SIGA製程技術,研製PDMS微反應器(microreactor),並由流體數值分析(computational fluidic dynamics, CFD)軟體的模擬結果得知,研究中所設計之微反應流道流率在150 ul/min~370 ul/min的範圍內有較佳的混合效果。 於矽模的蝕刻過程中,藉由添加界面活性劑(surfactant) Br+IPA於非等向性濕式蝕刻(anisotropic wet etching)蝕刻液之技術,改善使用單一添加劑時的缺點,使得蝕刻底切比率降低至0.563,蝕刻粗糙度達到23.48nm,成功蝕刻出所需之矽模。最後將完成之元件實際進行金奈米微粒的混製,在13~14 V的電壓驅動下,白金微加熱器能提供約120 ℃之加熱溫度,達到反應所需之熱能,並且在注射幫浦注射流率為8 ul/min的條件下,成功混製出吸收波長約為545 nm之金奈米微粒。
The making of nanoparticles is important of nano-technologies in present. Gold nanoparticles have been widely used in the fields of opto-electric and bio-inspecting technologies, because it’s size, optical properties, surface chemical properties, and nonpoisonous characteristics. Therefore, the related techniques for preparing gold nanoparticles are requested to high monodispersity and controllability of particle diameters recently. Compared with the traditional reactor, PDMS microreactor has advantages of high biocompatibility, easily controlled and observed, and batch production, which can significantly improve the drawbacks of poor average particle diameters and imprecise controlled, to reach the purposes of reactor controlled in accuracy and gold nanoparticles can be produced in batches. Therefore, the present work fabricated the microreactor by SIGA technology of MEMS. By the aid of the software CFD (computational fluidic dynamics) analysis in simulation, there was a better result of mixing when the range of microchannel flow rate is 150 to 370 ul/min. In the etching processes in silicon mold, using the technique of adding surfactant (Br + IPA) in anisotropic wet etching can improve the defect of using single additive. It lowered the etching undercut ratio to 0.563 and roughness to 23.48 nm, and get the good silicon mold successfully. Synthesizing the gold nanoparticles, the Pt microheater in the microreactor gave the voltage was 13 to 14 V could provide the heating temperature about 120 ℃, and synthesized the absorption wavelength was 545 nm successfully when injected rate of dual-syringe infusion pump was 8 ul/min.
URI: http://etds.lib.ntnu.edu.tw/cgi-bin/gs32/gsweb.cgi?o=dstdcdr&s=%22http://etds.lib.ntnu.edu.tw/cgi-bin/gs32/gsweb.cgi?o=dstdcdr&s=id=%22GN0693730109%22.&%22.id.&
http://rportal.lib.ntnu.edu.tw:80/handle/20.500.12235/97142
Other Identifiers: GN0693730109
Appears in Collections:學位論文

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