Please use this identifier to cite or link to this item: http://rportal.lib.ntnu.edu.tw:80/handle/20.500.12235/36963
Full metadata record
DC FieldValueLanguage
dc.contributor國立臺灣師範大學機電工程學系zh_tw
dc.contributor.authorHuang, Mao-Jungen_US
dc.contributor.authorYang, Chii-Rongen_US
dc.contributor.authorChiou, Yuang-Cherngen_US
dc.contributor.authorLee, Rong-Tsongen_US
dc.date.accessioned2014-10-30T09:36:17Z-
dc.date.available2014-10-30T09:36:17Z-
dc.date.issued2008-11-01zh_TW
dc.identifierntnulib_tp_E0403_01_020zh_TW
dc.identifier.issn0927-0248zh_TW
dc.identifier.urihttp://rportal.lib.ntnu.edu.tw/handle/20.500.12235/36963-
dc.description.abstractAfter the surface of a silicon wafer has been texturized, the reflectance of the wafer surface can be reduced to increase the power generation efficiency of a silicon-based solar cell. This study presents the integration of self-assembled nanosphere lithography (SANSL) and photo-assisted electrochemical etching (PAECE) to fabricate a nanostructure array with a high aspect ratio on the surface of silicon wafer, to reduce its reflectance. The experimental results show that the etching depth of the fabricated nanopore array structure is about View the MathML source and its diameter is about 90 nm, such that the aspect ratio of the pore can reach about 68:1. The weighted mean reflectance of a blank silicon wafer is 40.2% in the wavelength range of 280–890 nm. Five-minute PAECE without SANSL reduces the weighted mean reflectance to 5.16%. Five-minute PAECE with SANSL reduces the weighted mean reflectance to 1.73%. Further coating of a 200 Å thick silicon nitride layer on the surface of a nanostructure array reduces the weighted mean reflectance even to 0.878%. The novel fabrication technology proposed in this study has the advantage of being low cost, and the fabricated nanostructure array can be employed as an antireflection structure in single crystalline silicon solar cells.en_US
dc.description.urihttp://www.sciencedirect.com/science?_ob=MImg&_imagekey=B6V51-4SWG0FT-1-K&_cdi=5773&_user=1227126&_pii=S0927024808001839&_origin=gateway&_coverDate=11%2F30%2F2008&_sk=999079988&view=c&wchp=dGLzVlz-zSkzS&md5=93798ac50407a6dd781a210e2d919b88&ie=/sdarticle.pdfzh_TW
dc.languageenzh_TW
dc.publisherElsevieren_US
dc.relationSolar Energy Materials & Solar Cells, 92(11), 1352-1357.en_US
dc.relation.urihttp://dx.doi.org/10.1016/j.solmat.2008.05.014zh_TW
dc.subject.otherSANSLen_US
dc.subject.otherPAECEen_US
dc.subject.otherNanopore arrayen_US
dc.subject.otherAntireflection structureen_US
dc.titleFabrication of nanoporous antireflection surfaces on siliconen_US
Appears in Collections:教師著作

Files in This Item:
There are no files associated with this item.


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.